发明名称 SURFACE-WORKING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a surface-working device for electron release at high efficiency. SOLUTION: A nitride semiconductor, comprising AlxByGa1-x-yN (0<=x<=1, 0<=y<=1, where 0<=x+y<=1) or Al, Si or N, is provided on the surface of a probe 11, at least on the surface of a probe needle-like part 111. With the nitride semiconductor provided on the probe, an electric field required for electron release of material is about 1/100 of W, while a current value is 100 times that of the conventional technology, since the entire surface of water can be drawn in a very short time. With a first and a third surface working devices, the probe is flat, while a plurality of anodes comprised so that a desired region on a substrate is efficiently worked, requiring no fine movement device for moving the substrate.</p>
申请公布号 JP2002015990(A) 申请公布日期 2002.01.18
申请号 JP20010119473 申请日期 2001.04.18
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 KAKAZU MAKOTO;KOBAYASHI NAOKI
分类号 G03F7/20;H01J1/30;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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