发明名称 MOS TRANSISTOR WITH RECESSED GATE AND FABRICATING METHOD THEREOF TO CONTROL ROLLING-OFF OF THRESHOLD VOLTAGE AND SHORT CHANNEL EFFECT LIKE PUNCH-THROUGH
摘要 PURPOSE: A MOS(metal oxide semiconductor) transistor with a recessed gate is provided to control rolling-off of a threshold voltage and a short channel effect like punch-through by forming an isolation trench of a reverse trench type. CONSTITUTION: A semiconductor substrate is prepared. A trench isolation layer(370) for defining an active region is positioned in the semiconductor substrate wherein at least the lower part of the sidewall of the trench isolation layer has a negative slope. A recessed gate(750) is positioned in a predetermined region of the active region wherein the bottom surface of the recessed gate comes in contact with the negatively sloped sidewall of the trench isolation layer.
申请公布号 KR20050018187(A) 申请公布日期 2005.02.23
申请号 KR20030056264 申请日期 2003.08.13
申请人 发明人
分类号 H01L21/336;H01L21/8234;H01L21/8242;H01L29/78;(IPC1-7):H01L21/336 主分类号 H01L21/336
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