发明名称 |
MOS TRANSISTOR WITH RECESSED GATE AND FABRICATING METHOD THEREOF TO CONTROL ROLLING-OFF OF THRESHOLD VOLTAGE AND SHORT CHANNEL EFFECT LIKE PUNCH-THROUGH |
摘要 |
PURPOSE: A MOS(metal oxide semiconductor) transistor with a recessed gate is provided to control rolling-off of a threshold voltage and a short channel effect like punch-through by forming an isolation trench of a reverse trench type. CONSTITUTION: A semiconductor substrate is prepared. A trench isolation layer(370) for defining an active region is positioned in the semiconductor substrate wherein at least the lower part of the sidewall of the trench isolation layer has a negative slope. A recessed gate(750) is positioned in a predetermined region of the active region wherein the bottom surface of the recessed gate comes in contact with the negatively sloped sidewall of the trench isolation layer.
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申请公布号 |
KR20050018187(A) |
申请公布日期 |
2005.02.23 |
申请号 |
KR20030056264 |
申请日期 |
2003.08.13 |
申请人 |
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发明人 |
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分类号 |
H01L21/336;H01L21/8234;H01L21/8242;H01L29/78;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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