| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a gas supply method of heat treatment equipment performing a heat treatment, e.g. sintering, of a ceramic mold and a process for producing a ceramic electronic component in which the entire article can be sintered uniformly with no variation. <P>SOLUTION: In the gas supply method of heat treatment equipment for sintering an article W wherein the space between the surface 7 for mounting the article W and a ceiling surface 8 facing the mounting surface 7 serves as a channel 9 of atmospheric gas flowing along the mounting surface 7 and the opposite ends of the channel 9 serves as the inlets 10 and 11 of atmospheric gas, the atmospheric gas is controlled to flow into the channel 9 from the inlets 10 and 11 at a velocity V satisfying a formula: 4.0×(L<SB>τT</SB>)/(CD<SP>2</SP>)≥V≥0.5×(L<SB>τT</SB>)/(CD<SP>2</SP>). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
