发明名称 Compositions for planarization of metal-containing surfaces using halogens and halide salts
摘要 A planarization method includes providing a metal-containing surface (preferably, a Group VIII metal-containing surface, and more preferably a platinum-containing surface) and positioning it for contact with a polishing surface in the presence of a planarization composition that includes a halogen and a halide salt.
申请公布号 US7327034(B2) 申请公布日期 2008.02.05
申请号 US20050058140 申请日期 2005.02.15
申请人 MICRON TECHNOLOGY, INC. 发明人 VAARTSTRA BRIAN A.
分类号 B24B37/00;H01L23/52;C09G1/02;C09K3/14;C23F3/00;H01L21/302;H01L21/304;H01L21/311;H01L21/321;H01L21/4763 主分类号 B24B37/00
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