| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which is excellent in characteristics of foreign substances with time and also has good lithography characteristics, and a resist pattern forming method. <P>SOLUTION: The resist composition contains a resin component (A) of which the alkali solubility increases by the action of an acid and an acid generator component (B) which generates an acid upon exposure to light, wherein the resin component (A) contains a resin (A1) having a constitutional unit (a1) represented by formula (a1) and a constitutional unit (a2) represented by formula (a2) [wherein R<SP>1</SP>is an acid decomposable group represented by formula (I)], and wherein the resist composition further contains γ-butyrolactone in addition to the resin component (A) and the acid generator component (B). <P>COPYRIGHT: (C)2008,JPO&INPIT |
