Methods and Systems For Lithography Alignment,申请号US20070686142-传众专利搜索

发明名称	Methods and Systems For Lithography Alignment
摘要	Methods and systems for lithographically exposing a substrate based on a curvature profile of the substrate.
申请公布号	US2008233661(A1)	申请公布日期	2008.09.25
申请号	US20070686142	申请日期	2007.03.14
申请人	TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.	发明人	LU HSIAO-TZU;HSIEH HUNG CHANG;CHEN KUEI SHUN;FU HSUEH-HUNG;HSIEH CHING-HUA;SHUE SHAU-LIN
分类号	H01L21/00	主分类号	H01L21/00
代理机构		代理人
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