发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a fine transistor; or provide a transistor having less parasitic capacitance; or provide a transistor having high frequency characteristics; or provide a semiconductor device having the transistor.SOLUTION: A fine semiconductor device has an oxide semiconductor, a first conductor, a second conductor, a third conductor, a first insulator and a second insulator, in which the first conductor is embedded on a region between the second conductor and the third conductor via the first insulator.SELECTED DRAWING: Figure 1
申请公布号 JP2016139800(A) 申请公布日期 2016.08.04
申请号 JP20160008553 申请日期 2016.01.20
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI
分类号 H01L29/786;H01L21/336;H01L21/8234;H01L21/8242;H01L27/08;H01L27/088;H01L27/108 主分类号 H01L29/786
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