发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor package highly demanding miniaturization and higher density and supporting three dimensions with highly sufficient efficiency and at a low cost.SOLUTION: A method for manufacturing a semiconductor device comprises the steps of: (I) fixing a semiconductor element onto an extremely thin metal foil of a peelable metal foil via a photosensitive underfill film; (II) sealing the semiconductor element using a sealing material; (III) exposing a rear surface of the extremely thin metal foil; (IV) forming a wiring pattern by processing the extremely thin metal foil; and (V) forming a rewiring insulation layer on the wiring pattern.SELECTED DRAWING: Figure 6
申请公布号 JP2016139754(A) 申请公布日期 2016.08.04
申请号 JP20150015342 申请日期 2015.01.29
申请人 HITACHI CHEMICAL CO LTD 发明人 KURABUCHI KAZUHIKO;TAKEKOSHI MASAAKI;HAMAGUCHI KOJI;FUKUZUMI SHIZU;FUKUHARA KIICHI;MINEGISHI TOMONORI;MITSUKURA KAZUYUKI;ZEISHO RYOTA
分类号 H01L23/12;H01L21/60 主分类号 H01L23/12
代理机构 代理人
主权项
地址