发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor package highly demanding miniaturization and higher density and supporting three dimensions with highly sufficient efficiency and at a low cost.SOLUTION: A method for manufacturing a semiconductor device comprises the steps of: (I) fixing a semiconductor element onto an extremely thin metal foil of a peelable metal foil via a photosensitive underfill film; (II) sealing the semiconductor element using a sealing material; (III) exposing a rear surface of the extremely thin metal foil; (IV) forming a wiring pattern by processing the extremely thin metal foil; and (V) forming a rewiring insulation layer on the wiring pattern.SELECTED DRAWING: Figure 6 |
申请公布号 |
JP2016139754(A) |
申请公布日期 |
2016.08.04 |
申请号 |
JP20150015342 |
申请日期 |
2015.01.29 |
申请人 |
HITACHI CHEMICAL CO LTD |
发明人 |
KURABUCHI KAZUHIKO;TAKEKOSHI MASAAKI;HAMAGUCHI KOJI;FUKUZUMI SHIZU;FUKUHARA KIICHI;MINEGISHI TOMONORI;MITSUKURA KAZUYUKI;ZEISHO RYOTA |
分类号 |
H01L23/12;H01L21/60 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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