| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film which has high barrier performance, bending resistance, and smoothness and is excellent in cutting processability, and an organic photoelectric conversion element using the same.SOLUTION: A gas barrier film 1 has a gas barrier layer unit 5 on at least one side of a substrate 2. The gas barrier layer unit 5 has a first barrier layer 3 formed by a chemical vapor deposition method and a second barrier layer 4 obtained by subjecting, to a modification treatment, a coating film formed by applying a silicon compound onto the first barrier layer 3. The second barrier layer 4 has an unmodified region 4B on the substrate 2 side and a modified region 4A on the surface layer side.SELECTED DRAWING: Figure 1 |
