| 摘要 |
PURPOSE:To prevent the surface of a slider for a thin film magnetic head from being etched except a surface to be etched and improve the efficiency of etching operation by forming a protection film for etching prevention which is removed easily after the etching treatment on the surface of the slider except on the worked surface when the slider is worked by etching. CONSTITUTION:A mask for etching is formed after a film of metal such as aluminum, copper, nickel, and iron or resin such as photoresist is formed by vapor deposition, sputtering, or spin coating as a protection film 5 for turnaround etching prevention on the surface of a slider plate 1 except on the surface to be etched. Then, when the slider plate 1 is treated by ion milling, sputter etching, etc., the slider substrate and protection film 5 are etched and part of the protection film 5 is removed into the shape of an etched-away part 6. The protection film 5 is removed by waist etching, oxygen plasma treatment, etc., after the etching to obtain the slider part 1 having only the desired part etched. |
