| 摘要 |
A method of exposure used to form circuit patterns of a circuit chip of, for example, a magnetic bubble memory device or a semiconductor IC device whose circuit patterns are composed of a plurality of partially different circuit patterns. In this method, a plurality of projections of a single reticle is effected on a substrate as the substrate is moved by predetermined pitch lengths, and it is possible to form circuit patterns which are different from mere combination of the circuit patterns of the reticle. |
