| 摘要 |
<p>PURPOSE:To increase the freedom of pattern of a coloring layer and to enable formation of a large pattern by combining a negative type photosensitive resin and a specified mask. CONSTITUTION:All patterning is performed in an area corresponding to the coloring part of a color filter with one exposure by using a negative mask having transmissivities different for colors. The patterned area is successively developed and colored according to the order of transmissivity to form a multicolor coloring layer and a metal layer, and then transferred to a substrate. As for the photosensitive coating material to form the photosensitive coating film, such a coating material is used as that prepared by dispersing or dissolving a resin for photosensitive coating having the function of film forming and photosensitivity, a photopolymn. initiator, and as necessary, dye and/or pigment, etc., in water or in an org. solvent. Thereby, the freedom of patterns of the coloring layer is increased and without requiring high technique for fine working, and moreover, a metal layer which does not transmit light can be disposed without any space among the color filter picture elements and the pattern can be easily made large.</p> |
