发明名称 CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To improve contrast and to ensure high resolution, a high rate of a residual film and high sensitivity by using a diazomethane compd. having acid-dissociable groups as an acid generating agent. SOLUTION: This resist compsn. contains a coating film forming component whose alkali solubility is varied by the action of an acid an acid generating agent made of a diazomethane compd. represented by the formula, wherein each of R<1> and R<2> is a carbocyclic or heterocyclic group ring-substd. by an acid-dissociable group, R<1> and R<2> may be different from each other and the acid-dissociable group is, e.g. tert. alkyloxycarbonyl such as tert. butoxycarbonyl or tert. amyioxycarbonyl, tert. alkyloxycarbonylalkyl such as tert. butoxycarbonylmethyl, tert. alkyl such as tert. butyl, alkoxyalkyl such as ethoxyethyl or methoxypropyl or tetrahydropyranyl.
申请公布号 JPH1090884(A) 申请公布日期 1998.04.10
申请号 JP19970198979 申请日期 1997.07.24
申请人 TOKYO OHKA KOGYO CO LTD 发明人 NITTA KAZUYUKI;SATO KAZUFUMI;YAMAZAKI AKIYOSHI;SAKAI TOMOAKI;NAKAYAMA TOSHIMASA
分类号 G03F7/004;C07C381/14;H01L21/027;(IPC1-7):G03F7/004 主分类号 G03F7/004
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