发明名称 Integrated circuit device and fabricating method thereof
摘要 An integrated circuit device includes a substrate (1, 2, 11) comprising a semiconductor or a dielectric material, and circuit elements (3, 5, or 6) and thermoplastic resin substance (120, 121, or 122) electrically connected to the circuit elements (3, 5, or 6) disposed on the substrate (1, 2, 11). Therefore, since variation in the configuration of the thermoplastic resin substance (120, 121, or 122) is quite small relative to those of the wire, variation in the parasitic inductance due to variation in the configuration is reduced, and uniformity and reproducibility of the high frequency characteristics of the integrated circuit device are enhanced. A method for fabricating an integrated circuit device includes forming circuit elements (3, 5, or 6) on a substrate (1, 2, 11) comprising a semiconductor or a dielectric material, and forming thermoplastic resin substance (120, 121, or 122) electrically connected with the circuit elements (3, 5, or 6). Therefore, since variation in the configuration of the thermoplastic resin substance (120, 121, or 122) is quite small with relative to those in the wires, variation in the parasitic inductance due to variation in the configuration is reduced, and uniformity and reproducibility of the high frequency characteristics of the integrated circuit device are enhanced. <IMAGE>
申请公布号 EP0739034(A3) 申请公布日期 1999.07.14
申请号 EP19960104434 申请日期 1996.03.20
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 INOUE, AKIRA,;GOTO, KEI,;NOTANI, YOSHIHIRO,;NAKAJIMA, YASUHARU,;MATSUBAYASHI, HIROTO,;OHTA, YUKIO,
分类号 H01L23/538;H01L23/66 主分类号 H01L23/538
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