APPARATUS FOR PRODUCTION OF OPTICAL DISK

摘要

PROBLEM TO BE SOLVED: To make it possible to relieve a substrate temperature elevation and to form disks having good mechanical characteristics by forming thin films in a vacuum on optical disk substrates and disposing means for halting thin film formation at the time of formation. SOLUTION: A main chamber 13 internally has a cooling gas introducing pipe 17 having a valve 18 toward the optical disk substrate 19 arranged in a sputtering chamber by a substrate transporting mechanism in the position facing a target material 16 in a cathode 15 having a magnet. Cooling gaseous argon is passed toward the substrate from the cooling gas introducing pipe 17 to cool the substrate during the halt time of sputtering. The flow rate of the gas is changed by the halt time and the capacity of a vacuum pump and an effect is higher as the gas is passed at the largest possible flow rate. Krypton and gaseous xenon heavier than the argon is more effective than the argon for the cooling gas. Further, the effect is higher if the cooling gas is used by cooling the same down to room temperature or below, more preferably <=100 deg.C below zero.