发明名称 FORMATION OF MONOMOLECULAR BUILT-UP FILM PATTERN
摘要 PURPOSE:To enable pattern formation at a molecular level by forming the 1st monomolecular film on a substrate and irradiating radiations thereon to selectively convert the hydrophobic or hydrophilic property on the surface of the 1st monomolecular film and forming the 2nd monomolecular film. CONSTITUTION:The monomolecular film 2 consisting an either satd. or unsatd. long chain fatty acid (for example, CH3-(CH)n-COOH, n is integer) is built-up into 3 layers on the silicon substrate 1 having a hydrophobic surface. The surface part 3 of the built-up film of the monomolecular film 2 is regularly arranged with only the carboxyl groups 4 (i.e., hydrophilic groups) of the monomolecular film 2 consisting of the long chain fatty acid. The powerful radiations 5 are then irradiated partially thereon. The substrate is moved in the direction where the substrate emerges from the surface of the developing liquid in a Langmuir-Blodgett's technique under the same conditions as the conditions for forming the films up to the three layers, then the film 14 in the form in which the hydrophilic groups 4 face each other similarly as heretofore sticks to the parts 13 where the radiations are not irradiated with the 4th layer 12, but the film 14 does not stick to the irradiated parts 10 as the hydrophilic property is extremely weak.
申请公布号 JPS62262867(A) 申请公布日期 1987.11.14
申请号 JP19860107042 申请日期 1986.05.09
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAMURA HIDEJI
分类号 B05D1/20;B05D3/06;G03C1/74;G03C5/00;G03F7/00;G03F7/16;G03F7/20;G03F7/26;G03F7/38;H01L21/027;H01L21/30;H01L51/05;H01L51/40 主分类号 B05D1/20
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