| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new photosensitive resin composition having favorable coating property, having either surface roughness nor decrease in transmittance, having favorable clearance property with sufficient resolution for a fine pattern, and capable of leaving a narrow pattern such as a photo spacer. <P>SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound, (C) a photopolymerization initiator and (D) a solvent. The binder polymer (A) is a polymer comprising a structural unit expressed by formula (I) and constituted in such a manner that the amount of the structural unit expressed by formula (I) is in the range of ≥5 mol% and ≤20 mol% by molar fraction with respect to the whole structural units constituting the binder polymer (A). In formula (I), each of R<SP>1</SP>and R<SP>2</SP>independently represents a hydrogen atom or a 1-4C alkyl group. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
