发明名称 |
Writing of photo-induced structures |
摘要 |
A method of writing a photo-induced structure into a photosensitive material substrate, the method comprising the steps of creating an interference pattern utilising at least two light beams, exposing the substrate to the interference pattern for photo-inducing material changes in the substrate, and creating an irregularity in the interference pattern by controlling a wavefront of at least one of the beams, for creating a functional defect in the photo-induced structure.
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申请公布号 |
US2006125913(A1) |
申请公布日期 |
2006.06.15 |
申请号 |
US20050519903 |
申请日期 |
2005.11.16 |
申请人 |
SCEATS MARK;STEPANOV DMITRI Y |
发明人 |
SCEATS MARK;STEPANOV DMITRI Y. |
分类号 |
B41J2/435;G03F7/004;G02B5/18;G02B6/02;G02B6/122;G02B6/124;G02B6/13;G03F7/20;G11B7/00 |
主分类号 |
B41J2/435 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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