发明名称 REFLECTION TYPE EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a reflection type exposure device having a lens barrel which generates small fluctuations of air and is lightweight and highly rigid. <P>SOLUTION: The reflection type exposure device (100) includes a mask stage (40) holding a mask; a lighting optical system (10) lighting the mask with exposure light; the cylindrical lens barrel (50) having a first reflecting mirror (M1) reflecting exposure light transmitted through the mask, a second reflecting mirror (M2) reflecting exposure light reflected by the first reflecting mirror (M1), a third reflecting mirror (M3) reflecting exposure light reflected by the second reflecting mirror, and a fourth reflecting mirror (M4) reflecting exposure light reflected by the third reflecting mirror to return to the second reflecting mirror and then reflected by the reflecting mirror; and a substrate stage (60) holding a substrate to be exposed to the exposure light reflected by the fourth reflecting mirror, the lens barrel having a plurality of polygonal openings (50r, 50s) formed on its peripheral surface. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008311498(A) 申请公布日期 2008.12.25
申请号 JP20070158867 申请日期 2007.06.15
申请人 ORC MFG CO LTD 发明人 SATO HITOSHI;YAMAGA MASARU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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