发明名称 Method for processing silicon-based wire optical waveguide
摘要 A method is provided for processing a silicon-based wire optical waveguide, by which an optical transmission loss of the silicon-based wire optical waveguide due to ion irradiation with high energy is suppressed, and an end portion of the silicon-based wire optical waveguide that is three-dimensionally curved in a self-aligning manner is obtained. According to the method a protective film is selectively formed on the silicon-based wire optical waveguide exclusive of the end portion of the silicon-based wire optical waveguide; and ions are implanted to the silicon-based wire optical waveguide in a particular direction, so as to curve the end portion of the silicon-based wire optical waveguide to the particular direction in a self-alignment manner.
申请公布号 US9442249(B2) 申请公布日期 2016.09.13
申请号 US201414779921 申请日期 2014.01.20
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY 发明人 Yoshida Tomoya;Sakakibara Youichi;Mori Masahiko;Nishi Takashi
分类号 G02B6/125;G02B6/02;G02B6/132;G02B6/134;G02B6/245;G02B6/13;G02B6/122;G02B6/42;G02B6/12 主分类号 G02B6/125
代理机构 Hayes Soloway PC 代理人 Hayes Soloway PC
主权项 1. A method for processing a silicon-based wire optical waveguide, comprising a step of preparing an optical circuit board having plural silicon-based wire optical waveguides formed through a supporting layer; a step, for silicon-based wire optical waveguide that has an end portion among the silicon-based wire optical waveguides, of removing the supporting layer that is under the end portion of the silicon-based wire optical waveguide; a step of forming a protective film selectively on the silicon-based wire optical waveguide exclusive of the end portion of the silicon-based wire optical waveguide; and a step of implanting ions to the silicon-based wire optical waveguide in a particular direction, so as to curve the end portion of the silicon-based wire optical waveguide to the particular direction in a self-aligned manner.
地址 JP