| 摘要 |
<p>PURPOSE:To decrease the number of stages by forming metallic wirings which serve as the conductive routes of transparent electrodes simultaneously with the light shield of TFT (thin film transistors) or the upper metallic layer of spacers. CONSTITUTION:The metallic wirings 20 are constituted by forming one end thereof integrally to the light shield 6a of the TFTs 6 and extending the other end therefrom down the side wall part of the TFTs 6 to the circumferential edge part of a lower substrate 2. A material which is the same as the material of the light shield 6a of the TFTs 6 and has the excellent adhesiveness to the lower substrate consisting of glass, etc., and electrical conductivity is selected as the material to form the metallic wirings 20. The metallic wirings 20 are, therefore, formable simultaneously with the stage for forming the light shield 6a to the TFTs 6. The number of stages is thereby decreased.</p> |
