| 摘要 |
PROBLEM TO BE SOLVED: To provide a halftone phase shift mask blank and a halftone phase shift mask which does not cause changes in the optical consts. such as transmirsirity, refractive index and extinction coefft. even through processes of heat treatment and treatment with specified chemicals. SOLUTION: A translucent film 12 comprising zirconium or a zirconium compd. with controlled refractive index, extinction coefft. and film thickness is formed on a transparent substrate of quartz glass by sputtering a zirconium or zirconium silicide target in an atmosphere of nitrogen, oxygen, halogen gas or the like. Then the film is heat treated in air or oxidative atmosphere at >=200 deg.C to form an oxide film 13 on the translucent film 12 to produce a halftone phase shift mask blank 10. Then the halftone phase shift mask blank 10 is patterned to obtain a halftone phase shift mask 20. |
