| 摘要 |
<p>PROBLEM TO BE SOLVED: To position a wafer with high accuracy. SOLUTION: A table 6 is held between table holding parts 50A and 50B. The table holding parts 50A and 50B are put on an X-Y stage 8 which is driven on a wafer base 30 and held by Z-driving units 10A and 10B and flat springs 11A and 11B. A wafer (W) is chucked and held near to a deformed neutral face at the center of the table 6 via a wafer holder 7. A compensating plate 4 as a part in a projecting optical system PL is so provided that the compensating plate 4 covers the wafer (W), and electrostatic actuators 23A to 23C are put at the rear face of the table 6. After the X-Y stage 8 has been roughly positioned, the table 6 is positioned with high accuracy via the electrostatic actuators 23A to 23C. At the same time, a focus position and a slanted angle of the tale 6 are controlled via the Z-driving units 10A and 10B, in such a way that the face of the wafer (W) is focused on an image of the projecting optical system PL.</p> |
