| 摘要 |
PROBLEM TO BE SOLVED: To realize a protecting layer of a higher hardness and enhance a chemical/physical protection efficiency even when the protecting layer is thinned, by forming the protecting layer of an amorphous carbon nitride or amorphous hydrogenated carbon nitride substantially consisting of an alternating bond of carbon and nitrogen alternately bonded by a single bond. SOLUTION: When an incident light of a wavelength 600-950 nm is used to obtain a Raman scattering light spectrum of the amorphous carbon nitride or amorphous hydrogenated carbon nitride, a quantum yield of a Raman scattering light peak is preferably 10-5 or smaller around the vicinity of areas amounting to 1550 cm-1, 1350 cm-1 and 1330 cm-1. A protecting layer can be formed of a raw material of a saturated organic compound containing nitrogen (e.g. 2-aminooctahydro-1,3,5-triazine or the like) by plasma chemical vapor-phase growth with the use of plasma by a non-electronic collision excitation mechanism, or by ion beam deposition. The thickness of the protecting layer is preferably 0.5-10.0 nm.
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