METHOD FOR DETECTING POSITION

摘要

PROBLEM TO BE SOLVED: To provide a method for detecting a position highly accurately while minimizing the region of an alignment mark on a wafer. SOLUTION: In the method for detecting relative positional relation between a reticle and a wafer based on a reticle mark 22 formed on a reticle 1 and a wafer mark 24 formed on a wafer 5, the reticle mark 22 and the wafer mark 24 are irradiated with a detection beam and beams emitted from both marks 22 and 24 are received. Relative positional relation is detected based on the nest state of an image signal V22 corresponding to the reticle mark 22 and an image signal V24 corresponding to the wafer mark 24.