发明名称 FORMATION OF SELF-ASSEMBLED MONOLAYERS
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for forming self-assembled monolayers(SAM) on a substrate, and products having this sort of monolayers. SOLUTION: The self-assembled monolayers(SAM) are formed by using a compound containing semi-fluorinated sulfur or derivatives of semi-fluorinated silane, and compressed carbon dioxide(CO2 ) as a solvent. The molecule packing density of the monolayers is improved by changing temperature and/or pressure of the compressed CO2 during the formation. By employing the compressed CO2 as the solvent, the monolayers with superior molecule packing density are formed comparatively rapidly, without employing an unfavorable solvent for the environment.</p>
申请公布号 JP2002327283(A) 申请公布日期 2002.11.15
申请号 JP20010370544 申请日期 2001.12.04
申请人 SEIKO EPSON CORP;CAMBRIDGE UNIV TECHNICAL SERVICES LTD 发明人 FUKUSHIMA HITOSHI;MIYASHITA SATORU;ISHIDA MASAYA;HOLMES ANDREW;HUCK WILHELM;LUSCOMBE CHRISTINE KEIKO
分类号 B41J2/16;B05D1/18;C23C26/00;H01L51/00;H01L51/30;H01L51/50;H05B33/10;(IPC1-7):C23C26/00;H05B33/14 主分类号 B41J2/16
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