| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a quality control system which can reliably and accurately control a defect position of an exposure mask without any troubles when the quality of an exposure mask is controlled while allowing the presence of a defect and which does not inhibit the productivity. <P>SOLUTION: The quality control system for an exposure mask is applied in the processes of conducting the exposure mask formed in a mask house, inspected and delivered, into the production line after inspection in first and second receiving inspection. The inspection results corresponding to different processes are compared and outputted from the respective comparative determination sections A1, A2, A3, A4, A5 of a comparative determination station ST which is equipped with: a means to store the inspection results of the defects represented by coordinates from the defect inspection of the exposure mask in each process and from the defect inspection of a wafer subjected to the transfer process by the exposure mask; and a means to compare and determine the inspection results stored in the storage means. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
