发明名称 THIN-FILM FORMING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To enable a reflecting means (a mirror) to be appropriately moved in a thin-film forming apparatus for manufacturing a long oxide superconductor. <P>SOLUTION: In a thin-film forming apparatus which makes a laser beam emitted from a laser oscillation device to reflect on at least one reflecting means and irradiate a target of a thin-film-forming material, a reflecting means 200 is moved to an appropriate direction by using a moving means 100, in order to appropriately change a reflecting position of the laser beam r. Then, the thin-film forming apparatus prevents the laser beam r from constantly and concentratedly reflecting on the same position of a reflecting surface, due to the moving means 100, and accordingly greatly reduces the deterioration of the reflecting surface with the lapse of time. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005206907(A) 申请公布日期 2005.08.04
申请号 JP20040016475 申请日期 2004.01.26
申请人 FUJIKURA LTD 发明人 KAKIMOTO KAZUTOMI
分类号 C23C14/28;H01B7/295;H01B11/00 主分类号 C23C14/28
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