发明名称 Vertically stacked nonvolatile NAND type flash memory device with U-shaped strings, method for operating the same, and method for fabricating the same
摘要 A nonvolatile memory device includes a substrate including a plurality of active regions which are constituted by a P-type semiconductor; first and second vertical strings disposed over each active region, wherein each of the first and second strings includes a channel vertically extending from the substrate, a plurality of memory cells, and a select transistor, wherein the plurality of memory cells and the select transistor are located along the channel; and a bottom gate being interposed between a lowermost memory cell and the substrate, contacting the channel with a first gate dielectric layer interposed therebetween, and controlling connection of the first vertical string with the second vertical string.
申请公布号 US9362305(B2) 申请公布日期 2016.06.07
申请号 US201514734821 申请日期 2015.06.09
申请人 SK Hynix Inc. 发明人 Oh Seul-Ki;Lee Jun-Hyuk
分类号 G11C16/04;H01L27/11;G11C5/02;G11C5/06;G11C16/14;G11C16/26;H01L21/30;H01L21/76;H01L23/52;H01L27/10;H01L27/115;H01L21/306;H01L21/768;H01L23/528;H01L27/105 主分类号 G11C16/04
代理机构 IP & T Group LLP 代理人 IP & T Group LLP
主权项 1. A nonvolatile memory device comprising: a substrate including a plurality of active regions which are constituted by a P-type semiconductor; and first and second vertical strings disposed over each active region, wherein each of the first and second strings includes a channel vertically extending from the substrate, a plurality of memory cells, and a select transistor, wherein the plurality of memory cells and the select transistor are located along the channel; and wherein a word line of a lowermost memory cell among the plurality of memory cells controls connection of the first vertical string with the second vertical string, and wherein the channel is in a direct contact with a respective active region forming an interface between the channel and the respective active region.
地址 Gyeonggi-do KR
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