| 摘要 |
PURPOSE:To obtain a light and shade inverted negative type pattern without performing side etching, by forming a positive resist pattern on a metallic film adhered to a substrate, and changing the quality of the metallic film except at the pattern, and removing the pattern and the metallic film except at the quality-changed part. CONSTITUTION:A metallic film 2 adhered to a substrate 1 is coated with positive and then exposed and developed to form a positive resist pattern 3, which is irradiated with a laser beam 4 which has energy about one tenth as high as that used to correct the metal remaining defect of a metallic mask, thereby changing the metallic film except at the pattern into a metallic film 5 with superior etching resistance. After the pattern 3 is peeled off, the metallic film 2 is etched away, thus performing patterning. Consequently, an emulsion copy of an inverted pattern reticle is made unnecessary and a master or working makes free of side etching is manufactured. |
