| 摘要 |
PROBLEM TO BE SOLVED: To obtain a triblock oligomer manifesting anti-fogging effects right after molding, stable anti-fogging properties for long time when used in a resin composition. SOLUTION: The triblock oligomer has the structure of formula A-B-C [A is R<1> -X R<1> is an alkyl, an alkenyl, etc., X is O, OC(=O), etc.}; B is expressed by formula I (R<2> , R<3> are each an alkylene; m is 1 to 30; n is 0 to 29 and m+n <=30); C is -R<4> -Y-R<5> R<4> is an alkylene; Y is O, OC(=O), etc.; R<5> is H, an alkyl, etc.}], having weight average molecular weight of 100-8000 measured by gel- permeation chromatography, and obtained, for example, from montanic acid wax, polyoxyethylene lauryl ether, and methane sulfonic acid. This oligomer is obtained by carrying out a reaction of a higher aliphatic acid of 10 to 40C or a polyolefin containing carboxylic acid groups and a polyoxyalkylene compound of formula II (Z is OH, NH2 ), or a polyoxyalkylene compound of formula III. |
