发明名称 PROCESSING APPARATUS FOR SENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for processing a photosensitive material which uses a slot die and stabilizes developability from the start of coating application to the end thereof. SOLUTION: The processing apparatus having a coating application means for premetering and applying a processing liquid for the photosensitive material is provided with a means for removing the excess liquid of the processing liquid stagnating just before a wringer roller pair behind the coating application means. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005234437(A) 申请公布日期 2005.09.02
申请号 JP20040046111 申请日期 2004.02.23
申请人 MITSUBISHI PAPER MILLS LTD 发明人 OTSUKA MASAYOSHI;KUNIHIRO AKIRA;FUJIOKA HAJIME
分类号 G03F7/30;B05C11/02;G03D5/06;G03D13/00;(IPC1-7):G03D5/06 主分类号 G03F7/30
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