发明名称 |
PROCESSING APPARATUS FOR SENSITIVE MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for processing a photosensitive material which uses a slot die and stabilizes developability from the start of coating application to the end thereof. SOLUTION: The processing apparatus having a coating application means for premetering and applying a processing liquid for the photosensitive material is provided with a means for removing the excess liquid of the processing liquid stagnating just before a wringer roller pair behind the coating application means. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005234437(A) |
申请公布日期 |
2005.09.02 |
申请号 |
JP20040046111 |
申请日期 |
2004.02.23 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
OTSUKA MASAYOSHI;KUNIHIRO AKIRA;FUJIOKA HAJIME |
分类号 |
G03F7/30;B05C11/02;G03D5/06;G03D13/00;(IPC1-7):G03D5/06 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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