| 摘要 |
PROBLEM TO BE SOLVED: To maintain the flatness of a polishing surface of a grinding wheel even when the grinding wheel is in a wet condition by a liquid supplied during the polishing operation. SOLUTION: A polishing device is provided with a grinding wheel 13, a pedestal 15 to support the grinding wheel 13, and a holding member to hold a work 4 to be polished, and a surface to be polished is polished to be flat and mirror surface while sliding the surface to be polished of the work 4 to be polished while pressing against a grinding surface of the grinding wheel 13. The grinding wheel 13 is fixed to the pedestal 15 in a wet condition. |
