发明名称 |
Method for the rapid thermal control of a work piece in liquid or supercritical fluid |
摘要 |
A method for cleaning a semiconductor structure including providing a chamber for holding the semiconductor structure and a dense phase fluid, providing a thermal transfer device having a thermal transfer surface, connecting the thermal transfer device to the chamber, placing the semiconductor structure in the chamber in contact with the thermal transfer surface and thermally cycling the thermal transfer surface.
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申请公布号 |
US7288155(B2) |
申请公布日期 |
2007.10.30 |
申请号 |
US20050128022 |
申请日期 |
2005.05.12 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SIMONS JOHN P.;MCCULLOUGH KENNETH J.;MOREAU WAYNE M.;COTTE JOHN M.;POPE KEITH R.;TAFT CHARLES J.;GOLDFARB DARIO |
分类号 |
B08B3/00;B08B7/00;B08B7/04;H01L21/00 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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