发明名称 Methods to minimize contact resistance
摘要 A method is disclosed for making a metal electrode which minimizes the contact resistance between it and an organic semiconductor. Acid-stabilized metal nanoparticles are deposited upon a substrate and annealed. This creates a metal electrode and releases acid. Upon deposition of semiconductor and subsequent annealing, the acid diffuses from the electrode into the semiconductor layer and acts as a dopant, minimizing the contact resistance. The use of oleic acid-stabilized silver nanoparticles is demonstrated.
申请公布号 US7306969(B2) 申请公布日期 2007.12.11
申请号 US20050187552 申请日期 2005.07.22
申请人 XEROX CORPORATION 发明人 WU YILIANG;ONG BENG S.;LI YUNING
分类号 H01L51/40 主分类号 H01L51/40
代理机构 代理人
主权项
地址