发明名称 Vertical Spin Transistor and Method of Manufacturing the Same
摘要 A vertical spin transistor according to an embodiment of the present invention includes: a first source/drain layer including a layer formed of magnetic material; a protruding structure including, a channel layer formed on the first source/drain layer and including a layer formed of semiconductor, and a second source/drain layer formed on the channel layer and including a layer formed of magnetic material; a gate insulating film formed on a side of the channel layer; and a gate electrode formed on a surface of the gate insulating film.
申请公布号 US2008217711(A1) 申请公布日期 2008.09.11
申请号 US20070855322 申请日期 2007.09.14
申请人 SUGIYAMA NAOHARU;SAITO YOSHIAKI 发明人 SUGIYAMA NAOHARU;SAITO YOSHIAKI
分类号 H01L29/82;H01L21/336 主分类号 H01L29/82
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