| 发明名称 | Method of supplying cobalt to recess | ||
| 摘要 | A method of supplying cobalt to a recess formed in an insulation film of an object to be processed is disclosed. In one embodiment, the method includes forming a cobalt nitride film on a surface of the insulation film comprising a surface defining the recess, forming a cobalt film on the cobalt nitride film, and heating the cobalt film. | ||
| 申请公布号 | US9362167(B2) | 申请公布日期 | 2016.06.07 |
| 申请号 | US201514620886 | 申请日期 | 2015.02.12 |
| 申请人 | TOKYO ELECTRON LIMITED | 发明人 | Shimada Atsushi;Furukawa Shinji;Hatano Tatsuo |
| 分类号 | H01L21/20;H01L21/768;H01L21/285 | 主分类号 | H01L21/20 |
| 代理机构 | Nath, Goldberg & Meyer | 代理人 | Nath, Goldberg & Meyer ;Meyer Jerald L. |
| 主权项 | 1. A method of supplying cobalt to a recess formed in an insulation film of an object to be processed, comprising: forming a cobalt nitride film on a surface of the insulation film comprising a surface defining the recess; forming a cobalt film on the cobalt nitride film; and flowing cobalt making up the cobalt film toward a bottom of the recess by heating the object to be processed so as to fill the recess with cobalt from the bottom of the recess. | ||
| 地址 | Tokyo JP | ||