| 摘要 |
PROBLEM TO BE SOLVED: To provide a wet type atomization apparatus that can stably produce nanoparticles while suppressing the occurrence of pollutants (contamination) as much as possible.SOLUTION: A wet type atomization apparatus 100 has a constitution in which a high-pressure ejection-processing unit 151 for the high-pressure ejection from a high-pressure nozzle 41 provided within the chamber, and a plasma generation unit 160 are connected, and prescribed electrodes 31,32 are oppositely disposed in a reaction vessel 51 of the plasma generation unit 160; and the wet type atomization method includes high-pressure ejecting a raw-material solution 10 containing the aggregate of fine particles from a high-pressure nozzle 41 at a predetermined pressure, followed by subsequent in-liquid plasma processing within the reaction vessel 51.SELECTED DRAWING: Figure 2 |
