发明名称 Pulse controlled flushing system
摘要 The machining gap between a workpiece and an electrode is flushed by an increased flow of dielectric fluid during timed interruptions in the pulses producing electric discharge through the gap. The flushing period is prolonged until terminated by detection of a drop in voltage across the gap when the electrode reenters the workpiece following retraction that occurs simultaneously with interruption in the discharge producing pulses.
申请公布号 US3909577(A) 申请公布日期 1975.09.30
申请号 US19730423725 申请日期 1973.12.11
申请人 ELTEE PULSITRON(ENTIRE) 发明人 HOUMAN, LEIF
分类号 B23H1/00;B23H1/02;(IPC1-7):B23P1/08 主分类号 B23H1/00
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