| 摘要 |
PROBLEM TO BE SOLVED: To obtain a composition manipulable under conditions of a light safelight and excellent in sensitivity by mixing a photocurable resin with a photoreaction initiator and a photosensitizer containing a pyrrole compound so as to form a composition forming an unexposed coating film having a specified absorbance. SOLUTION: There is provided a composition used under conditions including irradiation with a safelight having a maximum wavelength of 500-620 nm and having a large relative luminosity, containing a pyrrole compound represented by the formula as the photosensitizer, and giving an unexposed coating film having an absorbance of 0.5 or below within the range of the maximum wavelength of safelight ±30 nm. In the formula, R1 is H, a 1-20C alkyl, a hydroxyalkyl, an alkoxyalkyl, an alkoxycarbonylalkyl, an aryl, an aralkyl, or an alkenyl; and R2 to R10 are each H, a halogen, nitro, cyano, hydroxyl, amino, aminocarbonyl, carboxyl, sulfo, a 1-20C alkyl, a halogenoalkyl, an alkoxyalkyl, an alkoxyl, or the like. |
