| 摘要 |
PURPOSE: To establish a new short-wavelength lithography system by combining a narrow-band laser and a monochromatic lens assembly for use. CONSTITUTION: The output of a CW laser 62 is directed toward a dichroic mirror 66 via a mirror 64 with a high reflection factor. The mirror 66 reflects an incidence beam with 6,328Åleft and right along an X-direction path shown by an arrow 68. Also, the mirror 66 transmits an incidence beam with 2,484Åemitted from an assembly 54 along a nearly the same X-direction. Therefore, the arrow 68 indicates a path, where a CW beam with 6,328Åand a pulse beam with 2,484Åcontinue to be propagated coaxially and enter galvanometer mirrors 20 and 22. The coaxial beams are reflected from the galvanometer mirrors 20 and 22 and are propagated towards the outside from a device 10 so as to constitute beams 18.
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