| 摘要 |
PROBLEM TO BE SOLVED: To provide a reticle which can prevent deterioration in superposition precision due to short rotation and an error of shot power without increasing the area of a dicing area and to provide the exposure device and method using the reticle. SOLUTION: Projections and recesses of the dicing area arranged one of the opposite sides of the external shape of a specific quadrangular area 2 formed of element formation areas 1A and 1B and the dicing area 3B sandwiched between them are so shaped as to engage recesses and projections of a dicing area arranged on the other opposite side. At the projection parts of the dicing area 3A, monitor mark areas 5 and 7 are arranged corresponding to all of four corner parts of the specific area 2. |
