发明名称 |
System and method for removing contaminant particles relative to an ion beam |
摘要 |
A system for inhibiting the transport of contaminant particles with an ion beam includes a particle charging system for charging particles within a region through which the ion beam travels. An electric field is generated downstream relative to the charged region so as to urge charged particles away from a direction of travel for the ion beam.
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申请公布号 |
US6476399(B1) |
申请公布日期 |
2002.11.05 |
申请号 |
US20000654379 |
申请日期 |
2000.09.01 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
HARRINGTON ERIC R.;BENVENISTE VICTOR M.;GRAF MICHAEL A.;RATHMELL ROBERT D. |
分类号 |
H01J27/20;H01J37/02;H01J37/04;H01J37/30;H01J37/317;H01L21/265;(IPC1-7):H01J37/30 |
主分类号 |
H01J27/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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