| 发明名称 |
Positive resist composition |
| 摘要 |
A positive resist composition comprising (A) a resin having a specific structure and capable of decomposing under action of an acid to increase solubility in an alkali developer, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
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| 申请公布号 |
US6969577(B2) |
申请公布日期 |
2005.11.29 |
| 申请号 |
US20040792306 |
申请日期 |
2004.03.04 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
ADEGAWA YUTAKA |
| 分类号 |
G03F7/039;C08F30/08;C09D183/06;G03F7/004;G03F7/075;H01L21/027;(IPC1-7):G03F7/004;G03F7/30 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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