发明名称 |
IMPRINT-LITHOGRAPHIEVERFAHREN, GERÄT HIERFÜR, SOWIE VERFAHREN ZUR HERSTELLUNG EINES HALBLEITERCHIPS |
摘要 |
An imprint method for imprinting an imprint pattern of a mold onto a pattern formation material on a substrate so as to realize a high throughput includes the steps of bringing the imprint pattern and the pattern formation material into contact with each other; applying a first pressure between the mold and the substrate to increase a contact area between the imprint pattern and the pattern formation material; and adjusting a positional relationship between the mold and the substrate at a second pressure lower than the first pressure. |
申请公布号 |
AT433134(T) |
申请公布日期 |
2009.06.15 |
申请号 |
AT20060122371T |
申请日期 |
2006.10.16 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SEKI, JUNICHI;SUEHIRA, NOBUHITO |
分类号 |
G03F7/00;B81C99/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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