发明名称 AUTO SHUTTER FOR SUBSTRATE PROCESSING APPARUTUS
摘要 The present invention relates to an auto shutter for a substrate processing apparatus, comprising: a rotational shaft unit; a door unit coupled to the rotational shaft unit and opening and closing a transfer space part in which a substrate is transferred according to rotation of the rotational shaft unit; and an air floating unit coupled to a portion of the door unit and spraying air upwards in a state in which the transfer space part is open to cause the substrate to float to be transferred. Since the substrate floating unit rotated together with the door unit is provided, the substrate can float to be transferred in a non-contacting manner, and thus, even though precipitate is produced, the precipitate does not come into direct contact with the substrate, preventing damage to the substrate.
申请公布号 KR20160081459(A) 申请公布日期 2016.07.08
申请号 KR20140195327 申请日期 2014.12.31
申请人 K.C.TECH CO., LTD. 发明人 SHIM, HYUNG SEOB;KIM, SUNG YUP
分类号 H01L21/677;H01L21/02;H01L21/302 主分类号 H01L21/677
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