| 摘要 |
PURPOSE:To prevent reduction in the sensitivity due to the dependency on atmosphere by incorporating phenols into sensitive resin. CONSTITUTION:The photon energy of soft X-ray radiated from an X-ray source is absorbed in the sensitive resin part of an X-ray resist by the photoelectric effect, and photoelectrons or Auger electrons having a certain extent of energy are released in the X-ray resist from atoms in the sensitive resin part. The secondary electrons produced in the sensitive resin part produce excited molecules, atoms or ions in the X-ray resist, and various free radicals are produced from the excited or ionized matter. A reaction such as cross-linking takes place in the X-ray resist by a reaction between the free radicals, and the patterning of the resist by the irradiation of X-rays is attained. When phenols are incorporated into the X-ray sensitive resin, the effect of oxygen in exposure atmosphere can be absorbed by the phenols as an antioxidant, so an X-ray resist material having fixed sensitivity independently of atmosphere is obtd. |
