| 摘要 |
Sensitisation of a photo-sensitive cinnamic resin (e.g. polycinnamate resin) by adding an N,N-dialkylaminobenzophenone (I) (where R1 and R2 are each alkyl; and X1-3 are each substituent groups such as H, alkyl, nitro, alkoxy or halogen). Mixture of 100 parts polyvinyl cinnamate and 10 parts N,N-dimethylaminobenzophenone was dissolved in ethyleneglycol monomethyl ether monoacetate to a concn. of 5 wt. % resin. The mixture was deposited on a Zn plate, dried and the sensitivity measured. The sensitivity at a Hg lamp of ultra high voltage was 2700, but in a mixture sensitised with 10 wt. % 5-nitroacenaphthene the sensitivity was 1100. |
