| 摘要 |
PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition not producing a gas liable to become a pollution source of an optical system and free from volume contraction and good in peelability from a substrate and superior in storage stability and adapted to a chemically sensitizable resist by adding specified resins and a specified diazodisulfone compound. SOLUTION: This radiation sensitive composition contains the resin having repeating units represented by formula I and repeating units represented by formula II and the diazodisulfone compound represented by formula III, and in formulae I-III, each of R1 and R2 is, independently, an H atom or a methyl group; R3 is an H atom or a methyl group; R4 is an H atom or a methyl on acetyl group; and each of R5 and R6 is, independently, a 4-18C univalent organic group. This resin composition does not produce aldehyde as a side product, and therefore, does not pollute the optical system, and it is free from volume contraction and good in peelability from the substrate, and superior in storage stability. |
