Clusters of an etchable material such as silver are deposited on a silicon substrate (10) to form peaks (12). The peaks (12) are then at least partially etched away by plasma etching to form cones (14) or pillars of silicon on the substrate (10).
申请公布号
WO9962106(A3)
申请公布日期
2000.03.02
申请号
WO1999GB01606
申请日期
1999.05.20
申请人
THE UNIVERSITY OF BIRMINGHAM;PALMER, RICHARD, EDWARD;SEEGER, KATRIN
